Publication:

Status of EUV lithography at IMEC

Date

2007
Journal article
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dc.contributor.authorGoethals, Mieke
dc.contributor.authorJonckheere, Rik
dc.contributor.authorLorusso, Gian
dc.contributor.authorHermans, Jan
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorMyers, Alan
dc.contributor.authorKim, In Sung
dc.contributor.authorNiroomand, Ardavan
dc.contributor.authorIwamoto, Fumio
dc.contributor.authorStepanenko, Nickolay
dc.contributor.authorRonse, Kurt
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-16T16:18:20Z
dc.date.available2021-10-16T16:18:20Z
dc.date.embargo9999-12-31
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12204
dc.source.beginpage383
dc.source.endpage292
dc.source.issue3
dc.source.journalJournal of Photopolymer Science & Technology
dc.source.volume20
dc.title

Status of EUV lithography at IMEC

dc.typeJournal article
dspace.entity.typePublication
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