Factors affecting an efficient sealing of porous low-K dielectrics by physical vapor deposition Ta(N) thin films

Publication:

2002

Journal article

Author(s)

Iacopi, Francesca

;

;

;

Shamiryan, Denis

;

;

Brijs, Bert

;

Kreissig, U.

;

Van Hove, Marleen

;

Journal of Applied Physics

1860 since deposited on 2021-10-14

Acq. date: 2026-09-30