Publication:
Factors affecting an efficient sealing of porous low-K dielectrics by physical vapor deposition Ta(N) thin films
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1858 since deposited on 2021-10-14
2last month
Acq. date: 2026-02-24
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Statistics
Views
1858 since deposited on 2021-10-14
2last month
Acq. date: 2026-02-24
Citations