Publication:

Single exposure EUV block downscaling for metal pitches below 32nm

Date

2017
Proceedings Paper
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dc.contributor.authorFranke, Joern-Holger
dc.contributor.authorColsters, Paul
dc.contributor.authorBekaert, Joost
dc.contributor.authorHendrickx, Eric
dc.contributor.authorWittebrood, F.
dc.contributor.authorPathak, Abhinav
dc.contributor.authorSchiffelers, Guido
dc.contributor.imecauthorFranke, Joern-Holger
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorPathak, Abhinav
dc.contributor.imecauthorSchiffelers, Guido
dc.contributor.orcidimecFranke, Joern-Holger::0000-0002-3571-1633
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecHendrickx, Eric::0000-0003-2516-0417
dc.date.accessioned2021-10-24T04:49:16Z
dc.date.available2021-10-24T04:49:16Z
dc.date.embargo9999-12-31
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28351
dc.identifier.urlhttp://www.aot.uni-erlangen.de/fileadmin/aot/img/events/2017/FraunhoferIISB_Flyer_15th-Lithography-Workshop-2017.pdf
dc.source.conference15th Fraunhofer IISB Lithography Simulation Workshop
dc.source.conferencedate21/09/2017
dc.source.conferencelocationBehringersmühle Germany
dc.title

Single exposure EUV block downscaling for metal pitches below 32nm

dc.typeProceedings paper
dspace.entity.typePublication
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