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Studying the efficacy of hydrogen plasma treatment for enabling the etching of thermally annealed ruthenium in chemical solutions
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Studying the efficacy of hydrogen plasma treatment for enabling the etching of thermally annealed ruthenium in chemical solutions
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Date
2023
Journal article
https://doi.org/10.1016/j.mne.2023.100208
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Le, Quoc Toan
;
Arslan, Esen
;
Rip, Jens
;
De Coster, Hanne
;
Verdonck, Patrick
;
Radisic, Dunja
;
Schleicher, Filip
;
Vaesen, Inge
;
Conard, Thierry
;
Altamirano Sanchez, Efrain
Journal
MICRO AND NANO ENGINEERING
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1049
since deposited on 2023-08-20
Acq. date: 2025-12-16
Citations
Metrics
Views
1049
since deposited on 2023-08-20
Acq. date: 2025-12-16
Citations