Publication:

Studying the efficacy of hydrogen plasma treatment for enabling the etching of thermally annealed ruthenium in chemical solutions

Date

2023
Journal article
https://doi.org/10.1016/j.mne.2023.100208
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dc.contributor.authorLe, Quoc Toan
dc.contributor.authorArslan, Esen
dc.contributor.authorRip, Jens
dc.contributor.authorDe Coster, Hanne
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorRadisic, Dunja
dc.contributor.authorSchleicher, Filip
dc.contributor.authorVaesen, Inge
dc.contributor.authorConard, Thierry
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorArslan, Esen
dc.contributor.imecauthorRip, Jens
dc.contributor.imecauthorDe Coster, Hanne
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorRadisic, Dunja
dc.contributor.imecauthorSchleicher, Filip
dc.contributor.imecauthorVaesen, Inge
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecRip, Jens::0009-0006-7414-2898
dc.contributor.orcidimecDe Coster, Hanne::0000-0002-5968-7703
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecSchleicher, Filip::0000-0003-3630-7285
dc.contributor.orcidimecVaesen, Inge::0000-0003-3533-4679
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecAltamirano Sanchez, Efrain::0000-0003-3235-6055
dc.date.accessioned2023-10-11T10:26:14Z
dc.date.available2023-08-20T18:03:12Z
dc.date.available2023-10-11T10:26:14Z
dc.date.issued2023
dc.identifier.doi10.1016/j.mne.2023.100208
dc.identifier.issn2590-0072
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/42366
dc.publisherELSEVIER
dc.source.beginpageArt. 100208
dc.source.endpagena
dc.source.issueJune
dc.source.journalMICRO AND NANO ENGINEERING
dc.source.numberofpages8
dc.source.volume19
dc.subject.keywordsSODIUM PERIODATE
dc.subject.keywordsMECHANICAL PLANARIZATION
dc.subject.keywordsRU
dc.subject.keywordsSLURRY
dc.subject.keywordsRUCMP
dc.title

Studying the efficacy of hydrogen plasma treatment for enabling the etching of thermally annealed ruthenium in chemical solutions

dc.typeJournal article
dspace.entity.typePublication
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