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High mobility In0.53Ga0.47As MOSFETs with steep sub-threshold slope achieved by remote reduction of native III-V oxides with metal electrodes
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High mobility In0.53Ga0.47As MOSFETs with steep sub-threshold slope achieved by remote reduction of native III-V oxides with metal electrodes
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Date
2017
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Yoshida, Shinichi
;
Lin, Dennis
;
Vais, Abhitosh
;
Alian, AliReza
;
Franco, Jacopo
;
El Kazzi, Salim
;
Mols, Yves
;
Miyanami, Yuki
;
Nakazawa, M.
;
Collaert, Nadine
;
Watanabe, H.
;
Thean, Aaron
Journal
IEEE Journal of the Electron Devices Society
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1936
since deposited on 2021-10-24
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Acq. date: 2025-12-10
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Metrics
Views
1936
since deposited on 2021-10-24
1
last month
Acq. date: 2025-12-10
Citations