Publication:
High Ge content SiGe selective processes for source/drain in manufacturing the next generations of pMOS transistors
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1914 since deposited on 2021-10-21
1last month
Acq. date: 2026-06-06
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Statistics
Views
1914 since deposited on 2021-10-21
1last month
Acq. date: 2026-06-06
Citations