Publication:
High Ge content SiGe selective processes for source/drain in manufacturing the next generations of pMOS transistors
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1913 since deposited on 2021-10-21
1last month
Acq. date: 2025-12-15
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Metrics
Views
1913 since deposited on 2021-10-21
1last month
Acq. date: 2025-12-15
Citations