Defectivity reduction in EUV resists through novel high-performance Point-Of-Use (POU) filters

dc.contributor.author	Zhang, Yiren
dc.contributor.author	Umeda, Toru
dc.contributor.author	Sakakibara, Hirokazu
dc.contributor.author	Ibrahim, Sheik Ansar Usman
dc.contributor.author	Sakamoto, Atsushi
dc.contributor.author	Singh, Amarnauth
dc.contributor.author	Shick, Robert
dc.contributor.author	Skjonnemand, Karl
dc.contributor.author	Foubert, Philippe
dc.contributor.author	Drent, Waut
dc.contributor.imecauthor	Drent, Waut
dc.date.accessioned	2024-03-25T12:57:25Z
dc.date.available	2023-07-28T17:39:57Z
dc.date.available	2024-03-25T12:57:25Z
dc.date.issued	2023
dc.identifier.doi	10.1117/12.2660389
dc.identifier.eisbn	978-1-5106-6104-2
dc.identifier.isbn	978-1-5106-6103-5
dc.identifier.issn	0277-786X
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/42240
dc.publisher	SPIE-INT SOC OPTICAL ENGINEERING
dc.source.conference	Conference on Advances in Patterning Materials and Processes XL
dc.source.conferencedate	FEB 27-MAR 01, 2023
dc.source.conferencelocation	San Jose
dc.source.journal	N/A
dc.source.numberofpages	6
dc.source.volume	12498
dc.title	Defectivity reduction in EUV resists through novel high-performance Point-Of-Use (POU) filters
dc.type	Proceedings paper
dspace.entity.type	Publication
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