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Spin on metal oxide materials for N7 and beyond patterning applications

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dc.contributor.authorMannaert, Geert
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorHopf, Toby
dc.contributor.authorSebaai, Farid
dc.contributor.authorLorant, Christophe
dc.contributor.authorPetermann, Claire
dc.contributor.authorHong, S-E
dc.contributor.authorMullen, S
dc.contributor.authorWolfer, E
dc.contributor.authorMckenzie, D
dc.contributor.authorYao, H
dc.contributor.authorRahman, D
dc.contributor.authorCho, J-Y
dc.contributor.authorPadmanaban, M
dc.contributor.authorPiumi, Daniele
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorHopf, Toby
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorLorant, Christophe
dc.contributor.imecauthorPetermann, Claire
dc.contributor.imecauthorPiumi, Daniele
dc.contributor.orcidimecLorant, Christophe::0000-0001-7363-9348
dc.date.accessioned2021-10-24T08:42:34Z
dc.date.available2021-10-24T08:42:34Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28911
dc.identifier.urlhttp://dx.doi.org/10.1117/12.2264323
dc.source.beginpage101490T
dc.source.conferenceAdvanced Etch Technology for Nanopatterning VI
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose, CA USA
dc.title

Spin on metal oxide materials for N7 and beyond patterning applications

dc.typeProceedings paper
dspace.entity.typePublication
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