Publication:

Physical characterization of ALD Al2O3 films deposited on GaAs substrates

Date

2008
Meeting abstract
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dc.contributor.authorFranquet, Alexis
dc.contributor.authorConard, Thierry
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorSioncke, Sonja
dc.contributor.authorCaymax, Matty
dc.contributor.authorDelabie, Annelies
dc.contributor.authorHeyns, Marc
dc.contributor.authorMeuris, Marc
dc.contributor.authorBrammertz, Guy
dc.contributor.authorVan Hemmen, J.L.
dc.contributor.authorKeuning, W
dc.contributor.authorKessels, W.M.M.
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorBrammertz, Guy
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.contributor.orcidimecBrammertz, Guy::0000-0003-1404-7339
dc.date.accessioned2021-10-17T07:08:57Z
dc.date.available2021-10-17T07:08:57Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13737
dc.source.beginpage46
dc.source.conference14th International Conference on Thin Films - ICTF 14
dc.source.conferencedate17/11/2008
dc.source.conferencelocationGent Belgium
dc.title

Physical characterization of ALD Al2O3 films deposited on GaAs substrates

dc.typeMeeting abstract
dspace.entity.typePublication
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