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Magnetic field imaging and light induced capacitance alteration for failure analysis of Cu-TSV interconnects
Publication:
Magnetic field imaging and light induced capacitance alteration for failure analysis of Cu-TSV interconnects
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Date
2020
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
De Wolf, Ingrid
;
Jacobs, Kristof J.P.
;
Orozco, Antonio
Journal
Microelectronics Reliability
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1990
since deposited on 2021-10-28
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last month
Acq. date: 2026-02-27
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Statistics
Views
1990
since deposited on 2021-10-28
2
last month
Acq. date: 2026-02-27
Citations