Publication:

Advanced metrologies for cleans characterization: ARXPS, GIXF and NEXAFS

Date

2008
Proceedings Paper
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dc.contributor.authorConard, Thierry
dc.contributor.authorList, Scott
dc.contributor.authorClaes, Martine
dc.contributor.authorBeckhoff, Buckard
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorClaes, Martine
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.accessioned2021-10-17T06:36:56Z
dc.date.available2021-10-17T06:36:56Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13554
dc.source.beginpage281
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces VIII - UCPSS
dc.source.conferencedate18/09/2006
dc.source.conferencelocationAntwerpen Belgium
dc.source.endpage284
dc.title

Advanced metrologies for cleans characterization: ARXPS, GIXF and NEXAFS

dc.typeProceedings paper
dspace.entity.typePublication
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