Publication:

A novel low temperature etch approach to reduce ULK plasma damage

Date

2015
Meeting abstract
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Author(s)

Zhang, Liping  
;
de Marneffe, Jean-Francois  
;
Leroy, F.
;
Ljazouli, R.
;
Lefaucheux, P.
;
Tillocher, T
;
Dussart, R.
;
Maekawa, K.
;
Yatsuda, K.
;
Dussarrat, C.
;
De Gendt, Stefan  
;
Baklanov, Mikhaïl

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