Publication:

Thermal stability of high k layers

Date

2003
Proceedings Paper
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dc.contributor.authorZhao, Chao
dc.contributor.authorCosnier, V.
dc.contributor.authorChen, P.J.
dc.contributor.authorRichard, Olivier
dc.contributor.authorRoebben, G.
dc.contributor.authorMaes, Jan
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorBender, Hugo
dc.contributor.authorYoung, Edward
dc.contributor.authorVan der Biest, O.
dc.contributor.authorCaymax, Matty
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-15T07:59:14Z
dc.date.available2021-10-15T07:59:14Z
dc.date.embargo9999-12-31
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8439
dc.source.beginpage9
dc.source.conferenceNovel Materials and Processes for Advanced CMOS
dc.source.conferencedate2/12/2002
dc.source.conferencelocationBoston, MA USA
dc.source.endpage14
dc.title

Thermal stability of high k layers

dc.typeProceedings paper
dspace.entity.typePublication
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