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ToF-SIMS depth profiling of Hf and Al composition variations in ultrathin mixed HfO2/Al2O3 oxides

Date

2004
Journal article
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dc.contributor.authorHoussiau, L.
dc.contributor.authorVitchev, R.G.
dc.contributor.authorConard, Thierry
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorBender, Hugo
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorBender, Hugo
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.accessioned2021-10-15T13:57:24Z
dc.date.available2021-10-15T13:57:24Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9067
dc.source.beginpage585
dc.source.endpage589
dc.source.journalApplied Surface Science
dc.source.volume231-232
dc.title

ToF-SIMS depth profiling of Hf and Al composition variations in ultrathin mixed HfO2/Al2O3 oxides

dc.typeJournal article
dspace.entity.typePublication
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