Publication:

Strain relaxation of SiGe buffers on Si and SOI wafers induced by He+ ion implantation and thermal annealing

Date

Loading...
Thumbnail Image

Abstract

Description

Statistics

Views

1973 since deposited on 2021-10-15
1last month
Acq. date: 2026-05-16

Citations

Statistics

Views

1973 since deposited on 2021-10-15
1last month
Acq. date: 2026-05-16

Citations