Publication:

1.5×10-9 Ω·cm² Contact Resistivity on Highly Doped Si:P Using Ge Pre-amorphization and Ti Silicidation

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4 since deposited on 2021-10-23
Acq. date: 2026-01-07

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2192 since deposited on 2021-10-23
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Acq. date: 2026-01-07

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4 since deposited on 2021-10-23
Acq. date: 2026-01-07

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2192 since deposited on 2021-10-23
3last month
Acq. date: 2026-01-07

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