Publication:

Fluorinated polymethacrylates as highly sensitive non-chemically amplified e-beam resists

Date

2009
Proceedings Paper
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dc.contributor.authorStraham, Jeffrey
dc.contributor.authorAdams, Jacob
dc.contributor.authorJen, Wei-Lun
dc.contributor.authorVanleenhove, Anja
dc.contributor.authorNeikirk, Colin
dc.contributor.authorRochelle, Timothy
dc.contributor.authorGronheid, Roel
dc.contributor.authorWillson, Grant
dc.contributor.imecauthorVanleenhove, Anja
dc.contributor.imecauthorGronheid, Roel
dc.date.accessioned2021-10-18T03:24:58Z
dc.date.available2021-10-18T03:24:58Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16276
dc.source.beginpage72733G
dc.source.conferenceAdvances in Resist Materials and Processing Technology XXVI
dc.source.conferencedate22/02/2009
dc.source.conferencelocationSan Jose, CA USA
dc.title

Fluorinated polymethacrylates as highly sensitive non-chemically amplified e-beam resists

dc.typeProceedings paper
dspace.entity.typePublication
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