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Comparative study of SiOCH low-k films with varied porosity interacting with etching and cleaning plasma
Publication:
Comparative study of SiOCH low-k films with varied porosity interacting with etching and cleaning plasma
Date
2002
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Shamiryan, Denis
;
Baklanov, Mikhaïl
;
Vanhaelemeersch, Serge
;
Maex, Karen
Journal
Journal of Vacuum Science & Technology B
Abstract
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1925
since deposited on 2021-10-14
Acq. date: 2025-10-22
Citations
Metrics
Views
1925
since deposited on 2021-10-14
Acq. date: 2025-10-22
Citations