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Impact of vacuum ultraviolet photons on ultrathin negative tone resists for extreme ultraviolet lithography during plasma etching
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Impact of vacuum ultraviolet photons on ultrathin negative tone resists for extreme ultraviolet lithography during plasma etching
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Date
2025-02-26
Journal article
https://doi.org/10.1116/6.0004265
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Arvind, Shikhar
;
Fallica, Roberto
;
Bezard, Philippe
;
Petersen, John
;
De Gendt, Stefan
;
Witting Larsen, Esben
Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
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since deposited on 2025-03-09
Acq. date: 2026-01-06
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since deposited on 2025-03-09
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Acq. date: 2026-01-06
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Downloads
1
since deposited on 2025-03-09
Acq. date: 2026-01-06
Views
173
since deposited on 2025-03-09
3
last month
2
last week
Acq. date: 2026-01-06
Citations