Publication:

Impact of vacuum ultraviolet photons on ultrathin negative tone resists for extreme ultraviolet lithography during plasma etching

Date

2025-02-26
Journal article
https://doi.org/10.1116/6.0004265
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dc.contributor.authorArvind, Shikhar
dc.contributor.authorFallica, Roberto
dc.contributor.authorBezard, Philippe
dc.contributor.authorPetersen, John
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorWitting Larsen, Esben
dc.contributor.imecauthorArvind, Shikhar
dc.contributor.imecauthorFallica, Roberto
dc.contributor.imecauthorBezard, Philippe
dc.contributor.imecauthorPetersen, John
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorWitting Larsen, Esben
dc.contributor.orcidimecArvind, Shikhar::0000-0002-4748-7763
dc.contributor.orcidimecFallica, Roberto::0000-0003-4523-9624
dc.contributor.orcidimecBezard, Philippe::0000-0003-2499-0240
dc.contributor.orcidimecPetersen, John::0000-0003-4815-3770
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecWitting Larsen, Esben::0000-0002-6294-0896
dc.date.accessioned2025-03-14T08:26:11Z
dc.date.available2025-03-09T19:31:44Z
dc.date.available2025-03-14T08:26:11Z
dc.date.issued2025-02-26
dc.description.wosFundingTextThe authors would like to acknowledge FUJIFILM for providing the model resist samples used in this study. The authors would like to acknowledge the Materials Characterization and Analysis (MCA) group at imec for their help with AFM and XPS analysis. The authors would also like to thank Shreya Kundu and Laura Galleni at imec for their help with the IBE tool and FTIR analysis, respectively. The authors acknowledge funding from the imec Industrial Affiliation Program (IIAP). Shikhar Arvind acknowledges funding from KU Leuven for their doctoral studies.
dc.identifier.doi10.1116/6.0004265
dc.identifier.issn0734-2101
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45362
dc.publisherAVS
dc.source.beginpage023007-1
dc.source.endpage023007-12
dc.source.issue2
dc.source.journalJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
dc.source.numberofpages12
dc.source.volume43
dc.subject.disciplineMaterials science
dc.subject.keywordsREFRACTIVE-INDEX INCREASE
dc.subject.keywordsRELAXATION
dc.subject.keywordsSURFACE
dc.subject.keywordsARGON
dc.subject.keywordsFILMS
dc.title

Impact of vacuum ultraviolet photons on ultrathin negative tone resists for extreme ultraviolet lithography during plasma etching

dc.typeJournal article
dspace.entity.typePublication
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