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Investigating metal oxide resists for patterning 28-nm pitch structures using single exposure extreme ultraviolet: defectivity, electrical test, and voltage contrast study
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Investigating metal oxide resists for patterning 28-nm pitch structures using single exposure extreme ultraviolet: defectivity, electrical test, and voltage contrast study
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Date
2022
Journal article
https://doi.org/10.1117/1.JMM.21.4.044901
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Sarkar, Sujan Kumar
;
Das, Sayantan
;
Blanco, Victor
;
Leray, Philippe
;
Halder, Sandip
Journal
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
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Downloads
319
since deposited on 2023-03-01
16
last month
4
last week
Acq. date: 2026-02-27
Views
1384
since deposited on 2023-03-01
Acq. date: 2026-02-27
Citations