Publication:

Investigating metal oxide resists for patterning 28-nm pitch structures using single exposure extreme ultraviolet: defectivity, electrical test, and voltage contrast study

Date

2022
Journal article
https://doi.org/10.1117/1.JMM.21.4.044901
Simple item page Full metadata Statistics
 
dc.contributor.authorSarkar, Sujan Kumar
dc.contributor.authorDas, Sayantan
dc.contributor.authorBlanco, Victor
dc.contributor.authorLeray, Philippe
dc.contributor.authorHalder, Sandip
dc.contributor.imecauthorSarkar, Sujan Kumar
dc.contributor.imecauthorDas, Sayantan
dc.contributor.imecauthorBlanco, Victor
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorHalder, Sandip
dc.contributor.orcidimecDas, Sayantan::0000-0002-3031-0726
dc.contributor.orcidimecLeray, Philippe::0000-0002-1086-270X
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecSarkar, Sujan Kumar::0000-0002-8471-6297
dc.contributor.orcidimecBlanco, Victor::0000-0003-4308-0381
dc.date.accessioned2023-04-06T14:23:46Z
dc.date.available2023-03-01T03:27:45Z
dc.date.available2023-04-06T14:23:46Z
dc.date.embargo2022-10-28
dc.date.issued2022
dc.identifier.doi10.1117/1.JMM.21.4.044901
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41203
dc.publisherSPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
dc.source.beginpageArt. 044901
dc.source.endpagena
dc.source.issue4
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.numberofpages17
dc.source.volume21
dc.title

Investigating metal oxide resists for patterning 28-nm pitch structures using single exposure extreme ultraviolet: defectivity, electrical test, and voltage contrast study

dc.typeJournal article
dspace.entity.typePublication
Files

Original bundle

Name:
044901_1.pdf
Size:
8.42 MB
Format:
Adobe Portable Document Format
Description:
Published version
Download
Publication available in collections:
Articles