Publication:

P implantation on doping of Ge: diffusion, activation, re-crystallization

Date

2005
Proceedings Paper
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dc.contributor.authorSatta, Alessandra
dc.contributor.authorJanssens, Tom
dc.contributor.authorClarysse, Trudo
dc.contributor.authorSimoen, Eddy
dc.contributor.authorMeuris, Marc
dc.contributor.authorBenedetti, Alessandro
dc.contributor.authorHoflijk, Ilse
dc.contributor.authorDe Jaeger, Brice
dc.contributor.authorDemeurisse, Caroline
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHoflijk, Ilse
dc.contributor.imecauthorDe Jaeger, Brice
dc.contributor.imecauthorDemeurisse, Caroline
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.contributor.orcidimecDe Jaeger, Brice::0000-0001-8804-7556
dc.date.accessioned2021-10-16T04:50:38Z
dc.date.available2021-10-16T04:50:38Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11165
dc.source.conferenceUSJ - The 8th Int. Workshop on the Fabrication, Characterization and Modeling of Ultra Shallow Junctions in Semiconductors
dc.source.conferencedate5/06/2005
dc.source.conferencelocationDaytona Beach, FL USA
dc.title

P implantation on doping of Ge: diffusion, activation, re-crystallization

dc.typeProceedings paper
dspace.entity.typePublication
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