Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Articles
Mask line roughness contribution in EUV lithography
Publication:
Mask line roughness contribution in EUV lithography
Copy permalink
Date
2011
Journal article
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
22914.pdf
1.38 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vaglio Pret, Alessandro
;
Gronheid, Roel
Journal
Microelectronic Engineering
Abstract
Description
Metrics
Views
1837
since deposited on 2021-10-19
Acq. date: 2025-12-15
Citations
Metrics
Views
1837
since deposited on 2021-10-19
Acq. date: 2025-12-15
Citations