Publication:

Mask line roughness contribution in EUV lithography

Date

2011
Journal article
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dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorGronheid, Roel
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.date.accessioned2021-10-19T20:01:46Z
dc.date.available2021-10-19T20:01:46Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19932
dc.source.beginpage2167
dc.source.endpage2170
dc.source.issue8
dc.source.journalMicroelectronic Engineering
dc.source.volume88
dc.title

Mask line roughness contribution in EUV lithography

dc.typeJournal article
dspace.entity.typePublication
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