Comparative analysis of the degradation mechanisms in logic and I/O FinFET devices induced by plasma damage

dc.contributor.author	Hiblot, Gaspard
dc.contributor.author	Liu, Yefan
dc.contributor.author	Hellings, Geert
dc.contributor.author	Van der Plas, Geert
dc.contributor.imecauthor	Hiblot, Gaspard
dc.contributor.imecauthor	Liu, Yefan
dc.contributor.imecauthor	Hellings, Geert
dc.contributor.imecauthor	Van der Plas, Geert
dc.contributor.orcidimec	Hiblot, Gaspard::0000-0002-3869-965X
dc.contributor.orcidimec	Hellings, Geert::0000-0002-5376-2119
dc.contributor.orcidimec	Van der Plas, Geert::0000-0002-4975-6672
dc.date.accessioned	2021-10-27T10:27:26Z
dc.date.available	2021-10-27T10:27:26Z
dc.date.embargo	9999-12-31
dc.date.issued	2019
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/33157
dc.identifier.url	https://ieeexplore.ieee.org/document/8720525
dc.source.beginpage	1
dc.source.conference	2019 IEEE International Reliability Physics Symposium (IRPS)
dc.source.conferencedate	31/03/2019
dc.source.conferencelocation	Monterey, CA USA
dc.source.endpage	5
dc.title	Comparative analysis of the degradation mechanisms in logic and I/O FinFET devices induced by plasma damage
dc.type	Proceedings paper
dspace.entity.type	Publication
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