Publication:
A metal hardmask approach for the contact patterning of a 0.186 μm² SRAM cell exposed with EUV lithography
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2 since deposited on 2021-10-17
Acq. date: 2025-10-23
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2003 since deposited on 2021-10-17
Acq. date: 2025-10-23
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2 since deposited on 2021-10-17
Acq. date: 2025-10-23
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2003 since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations