Publication:

A metal hardmask approach for the contact patterning of a 0.186 μm² SRAM cell exposed with EUV lithography

Date

2008
Meeting abstract
Simple item page Full metadata Statistics
Loading...
Thumbnail Image

Files

17398.pdf 120.08 KB

Author(s)

de Marneffe, Jean-Francois  
;
Goossens, Danny  
;
Vandervorst, Alain
;
Demuynck, Steven  
;
Goethals, Mieke
;
Hermans, Jan  
;
Van Roey, Frieda  
;
Baudemprez, Bart  
;
Brus, Stephan  
;
Vrancken, Christa  

Journal

Abstract

Description

Statistics

Downloads

2 since deposited on 2021-10-17
Acq. date: 2026-01-25

Views

2008 since deposited on 2021-10-17
3last month
Acq. date: 2026-01-25

Citations

Statistics

Downloads

2 since deposited on 2021-10-17
Acq. date: 2026-01-25

Views

2008 since deposited on 2021-10-17
3last month
Acq. date: 2026-01-25

Citations