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A metal hardmask approach for the contact patterning of a 0.186 μm² SRAM cell exposed with EUV lithography
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Acq. date: 2025-12-10
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Acq. date: 2025-12-10
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2 since deposited on 2021-10-17
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2005 since deposited on 2021-10-17
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Acq. date: 2025-12-10
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