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A metal hardmask approach for the contact patterning of a 0.186 μm² SRAM cell exposed with EUV lithography

Date

2008
Meeting abstract
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dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorGoossens, Danny
dc.contributor.authorVandervorst, Alain
dc.contributor.authorDemuynck, Steven
dc.contributor.authorGoethals, Mieke
dc.contributor.authorHermans, Jan
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorBaudemprez, Bart
dc.contributor.authorBrus, Stephan
dc.contributor.authorVrancken, Christa
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorGoossens, Danny
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.imecauthorBrus, Stephan
dc.contributor.imecauthorVrancken, Christa
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.contributor.orcidimecde Marneffe, Jean-Francois::0000-0001-5178-6670
dc.contributor.orcidimecBrus, Stephan::0000-0003-3554-0640
dc.date.accessioned2021-10-17T06:44:56Z
dc.date.available2021-10-17T06:44:56Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13606
dc.identifier.urlhttp://www2.avs.org/symposium2008/Papers/Paper_MS+NC-MoM1.html
dc.source.conferenceAmerican Vacuum Society Fall Meeting
dc.source.conferencedate19/10/2008
dc.source.conferencelocationBoston, MA USA
dc.title

A metal hardmask approach for the contact patterning of a 0.186 μm² SRAM cell exposed with EUV lithography

dc.typeMeeting abstract
dspace.entity.typePublication
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