Depth-profiling of vertical sidewall nanolayers on structured wafers by grazing incidence X-ray fluorescence

dc.contributor.author	Honicke, P.
dc.contributor.author	Beckhoff, B.
dc.contributor.author	Kolbe, M.
dc.contributor.author	List, Scott
dc.contributor.author	Conard, Thierry
dc.contributor.author	Struyf, Herbert
dc.contributor.imecauthor	Conard, Thierry
dc.contributor.imecauthor	Struyf, Herbert
dc.contributor.orcidimec	Conard, Thierry::0000-0002-4298-5851
dc.date.accessioned	2021-10-17T07:43:23Z
dc.date.available	2021-10-17T07:43:23Z
dc.date.issued	2008
dc.identifier.issn	0584-8547
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/13886
dc.source.beginpage	1359
dc.source.endpage	1364
dc.source.issue	12
dc.source.journal	Spectrochimica Acta B
dc.source.volume	63
dc.title	Depth-profiling of vertical sidewall nanolayers on structured wafers by grazing incidence X-ray fluorescence
dc.type	Journal article
dspace.entity.type	Publication
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