A new method for the lifetime determination of submicron metal interconnects by means of parallel test structure

dc.contributor.author	Vanstreels, Kris
dc.contributor.author	D'Olieslaeger, Marc
dc.contributor.author	De Ceuninck, Ward
dc.contributor.author	D'Haen, Jan
dc.contributor.author	Maex, Karen
dc.contributor.imecauthor	Vanstreels, Kris
dc.contributor.imecauthor	D'Olieslaeger, Marc
dc.contributor.imecauthor	De Ceuninck, Ward
dc.contributor.imecauthor	D'Haen, Jan
dc.contributor.imecauthor	Maex, Karen
dc.contributor.orcidimec	Vanstreels, Kris::0000-0002-4420-0966
dc.date.accessioned	2021-10-15T17:28:48Z
dc.date.available	2021-10-15T17:28:48Z
dc.date.issued	2004
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/9837
dc.source.beginpage	633
dc.source.conference	Proceedings 24th International Conference on Microelectronics - MIEL
dc.source.conferencedate	16/05/2004
dc.source.conferencelocation	Nis Serbia and Montenegro
dc.source.endpage	636
dc.title	A new method for the lifetime determination of submicron metal interconnects by means of parallel test structure
dc.type	Proceedings paper
dspace.entity.type	Publication
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