Interface sharpness in stacked thin film structures: a comparison of soft X-ray reflectometry and transmission electron microscopy

Ciesielski, Richard; Bogdanowicz, Janusz; Loo, Roger; Shimura, Yosuke; Mani, Antonio; Mitterbauer, Christoph; Kolbe, Michael; Soltwisch, Victor

doi:10.1117/1.jmm.23.4.041405

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Interface sharpness in stacked thin film structures: a comparison of soft X-ray reflectometry and transmission electron microscopy

Date

2024

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https://doi.org/10.1117/1.jmm.23.4.041405

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Mitterbauer, Christoph

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Kolbe, Michael

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Soltwisch, Victor

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JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3

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146 since deposited on 2025-01-09

Acq. date: 2026-08-10

Interface sharpness in stacked thin film structures: a comparison of soft X-ray reflectometry and transmission electron microscopy

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