Publication:

Interface sharpness in stacked thin film structures: a comparison of soft X-ray reflectometry and transmission electron microscopy

Date

2024
Journal article
https://doi.org/10.1117/1.JMM.23.4.041405
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dc.contributor.authorCiesielski, Richard
dc.contributor.authorBogdanowicz, Janusz
dc.contributor.authorLoo, Roger
dc.contributor.authorShimura, Yosuke
dc.contributor.authorMani, Antonio
dc.contributor.authorMitterbauer, Christoph
dc.contributor.authorKolbe, Michael
dc.contributor.authorSoltwisch, Victor
dc.contributor.imecauthorBogdanowicz, Janusz
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorShimura, Yosuke
dc.contributor.orcidimecBogdanowicz, Janusz::0000-0002-7503-8922
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecShimura, Yosuke::0000-0002-1944-9970
dc.date.accessioned2025-06-24T09:43:58Z
dc.date.available2025-01-09T17:22:31Z
dc.date.available2025-06-24T09:43:58Z
dc.date.embargo2024-08-23
dc.date.issued2024
dc.description.wosFundingTextThe project is supported by Chips Joint Undertaking (Grant No. 101096772) - 14ACMOS and (Grant No. 875999) - IT2 and its members, including the top-up funding of Belgium and the Netherlands, as well as from the EMPIR programme 20IND04 ATMOC. We wish to thank Qais Saadeh and Gavin Phillips for valuable discussions.
dc.identifier.doi10.1117/1.JMM.23.4.041405
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45051
dc.publisherSPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
dc.source.beginpageArt. 041405
dc.source.endpageN/A
dc.source.issue4
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.numberofpages14
dc.source.volume23
dc.subject.keywordsREFLECTION
dc.subject.keywordsSCATTERING
dc.subject.keywordsSURFACES
dc.title

Interface sharpness in stacked thin film structures: a comparison of soft X-ray reflectometry and transmission electron microscopy

dc.typeJournal article
dspace.entity.typePublication
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