Publication:

Reaction mechanisms of Sn-based polarity-change copolymer resists with different counter anions, designed for extreme ultraviolet lithography

Date

2025-FEB 1
Journal article
https://doi.org/10.35848/1347-4065/adaefd
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dc.contributor.authorHashimoto, Kohei
dc.contributor.authorTakata, Yui
dc.contributor.authorMuroya, Yusa
dc.contributor.authorKozawa, Takahiro
dc.contributor.authorMachida, Kohei
dc.contributor.authorEnomoto, Satoshi
dc.contributor.authorNaqvi, Bilal
dc.contributor.authorDe Simone, Danilo
dc.contributor.imecauthorNaqvi, Bilal
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.orcidimecNaqvi, Bilal::0000-0002-9080-6475
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.accessioned2025-02-24T17:58:31Z
dc.date.available2025-02-24T17:58:31Z
dc.date.issued2025-FEB 1
dc.identifier.doi10.35848/1347-4065/adaefd
dc.identifier.issn0021-4922
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45250
dc.publisherIOP Publishing Ltd
dc.source.issue2
dc.source.journalJAPANESE JOURNAL OF APPLIED PHYSICS
dc.source.numberofpages11
dc.source.volume64
dc.subject.keywordsSENSITIVITY
dc.title

Reaction mechanisms of Sn-based polarity-change copolymer resists with different counter anions, designed for extreme ultraviolet lithography

dc.typeJournal article
dspace.entity.typePublication
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