Publication:

Special Series Guest Editorial: EUV Masks

Date

2021
Editorial Material
https://doi.org/10.1117/1.JMM.20.3.031008
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dc.contributor.authorBurkhardt, Martin
dc.contributor.authorPhilipsen, Vicky
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.accessioned2022-04-21T08:11:39Z
dc.date.available2021-11-02T15:55:45Z
dc.date.available2022-03-28T11:51:37Z
dc.date.available2022-04-08T08:44:11Z
dc.date.available2022-04-11T06:47:35Z
dc.date.available2022-04-19T08:47:44Z
dc.date.available2022-04-21T08:11:39Z
dc.date.issued2021
dc.identifier.doi10.1117/1.JMM.20.3.031008
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37471
dc.publisherSPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
dc.source.issue3
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.numberofpages2
dc.source.volume20
dc.subject.keywordsEUV masks
dc.title

Special Series Guest Editorial: EUV Masks

dc.typeEditorial material
dspace.entity.typePublication
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