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TiN/TaN selective etch in replacement metal gate with chlorine based plasmas
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Acq. date: 2026-10-03
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3 since deposited on 2021-10-22
Acq. date: 2026-10-03
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1987 since deposited on 2021-10-22
2last month
Acq. date: 2026-10-04
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