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Conference contributions
TiN/TaN selective etch in replacement metal gate with chlorine based plasmas
Publication:
TiN/TaN selective etch in replacement metal gate with chlorine based plasmas
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Date
2014
Meeting abstract
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29556.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Tao, Zheng
;
Paraschiv, Vasile
;
Dekkers, Harold
;
Dangol, Anish
;
soon aik, chew
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Acq. date: 2025-12-15
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since deposited on 2021-10-22
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Acq. date: 2025-12-16
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3
since deposited on 2021-10-22
Acq. date: 2025-12-15
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1983
since deposited on 2021-10-22
6
last month
Acq. date: 2025-12-16
Citations