Publication:

TiN/TaN selective etch in replacement metal gate with chlorine based plasmas

Date

2014
Meeting abstract
Simple item page Full metadata Statistics
 
dc.contributor.authorTao, Zheng
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorDekkers, Harold
dc.contributor.authorDangol, Anish
dc.contributor.authorsoon aik, chew
dc.contributor.imecauthorTao, Zheng
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorDangol, Anish
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.date.accessioned2021-10-22T06:26:22Z
dc.date.available2021-10-22T06:26:22Z
dc.date.embargo9999-12-31
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24599
dc.source.conferencePlasma Etch and Strip in Microtechnology - PESM
dc.source.conferencedate12/05/2014
dc.source.conferencelocationGrenoble France
dc.title

TiN/TaN selective etch in replacement metal gate with chlorine based plasmas

dc.typeMeeting abstract
dspace.entity.typePublication
Files

Original bundle

Name:
29556.pdf
Size:
815.82 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions