Publication:
Elastic backscattering during boron implantation in Si1-xGex
| dc.contributor.author | Bai, Quan | |
| dc.contributor.author | Dialameh, Masoud | |
| dc.contributor.author | Morris, Richard | |
| dc.contributor.author | Vickridge, Ian | |
| dc.contributor.author | Vantomme, Andre | |
| dc.contributor.author | Meersschaut, Johan | |
| dc.contributor.imecauthor | Bai, Quan | |
| dc.contributor.imecauthor | Dialameh, Masoud | |
| dc.contributor.imecauthor | Meersschaut, Johan | |
| dc.contributor.imecauthor | Morris, Richard | |
| dc.contributor.orcidimec | Bai, Quan::0000-0002-9946-0693 | |
| dc.contributor.orcidimec | Dialameh, Masoud::0000-0002-1439-590X | |
| dc.contributor.orcidimec | Meersschaut, Johan::0000-0003-2467-1784 | |
| dc.contributor.orcidimec | Morris, Richard::0000-0002-0902-7088 | |
| dc.date.accessioned | 2025-06-11T13:44:34Z | |
| dc.date.available | 2024-03-01T18:13:05Z | |
| dc.date.available | 2025-06-11T13:44:34Z | |
| dc.date.issued | 2024 | |
| dc.description.wosFundingText | Quan Bai was funded by the China Scholarship Council [CSC number 202008510152]. The work at INSP was supported by the transnational access programme of the European Union's Horizon 2020 project RADIATE [grant number 824096]. Further, the work at imec was supported by ReMade@ARI, which is funded by the European Union as part of the Horizon Europe call HORIZON-INFRA-2021-SERV-01 under grant agreement number 101058414 and co-funded by UK Research and Innovation (UKRI) under the UK government's Horizon Europe funding guarantee [grant number 10039728] and by the Swiss State Secretariat for Education, Research and Innovation (SERI) under contract number 22.00187. | |
| dc.identifier.doi | 10.1016/j.vacuum.2023.112740 | |
| dc.identifier.issn | 0042-207X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/43610 | |
| dc.publisher | PERGAMON-ELSEVIER SCIENCE LTD | |
| dc.source.beginpage | Art. 112740 | |
| dc.source.endpage | N/A | |
| dc.source.issue | Part A, January | |
| dc.source.journal | VACUUM | |
| dc.source.numberofpages | 5 | |
| dc.source.volume | 219 | |
| dc.subject.keywords | NUCLEAR-REACTION ANALYSIS | |
| dc.subject.keywords | ION-IMPLANTATION | |
| dc.subject.keywords | RUTHERFORD BACKSCATTERING | |
| dc.subject.keywords | THIN-FILMS | |
| dc.subject.keywords | SIGE | |
| dc.subject.keywords | B-11(P,ALPHA)BE-8 | |
| dc.subject.keywords | ACCURACY | |
| dc.subject.keywords | FLUENCE | |
| dc.subject.keywords | GROWTH | |
| dc.subject.keywords | ENERGY | |
| dc.title | Elastic backscattering during boron implantation in Si1-xGex | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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