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Stress characterization of selective epitaxial Si1-xGex deposition for embedded source/drain before and after millisecond laser anneal
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Stress characterization of selective epitaxial Si1-xGex deposition for embedded source/drain before and after millisecond laser anneal
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Date
2009
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Bargallo Gonzalez, Mireia
;
Fernandez Lanas, Tatiana
;
Rosseel, Erik
;
Hikavyy, Andriy
;
Dekkers, Harold
;
Eneman, Geert
;
Verheyen, Peter
;
Loo, Roger
;
Simoen, Eddy
;
Claeys, Cor
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1847
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Acq. date: 2025-12-15
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Metrics
Views
1847
since deposited on 2021-10-17
1
last month
1
last week
Acq. date: 2025-12-15
Citations