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Stress characterization of selective epitaxial Si1-xGex deposition for embedded source/drain before and after millisecond laser anneal

Date

2009
Proceedings Paper
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dc.contributor.authorBargallo Gonzalez, Mireia
dc.contributor.authorFernandez Lanas, Tatiana
dc.contributor.authorRosseel, Erik
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorDekkers, Harold
dc.contributor.authorEneman, Geert
dc.contributor.authorVerheyen, Peter
dc.contributor.authorLoo, Roger
dc.contributor.authorSimoen, Eddy
dc.contributor.authorClaeys, Cor
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.accessioned2021-10-17T21:19:53Z
dc.date.available2021-10-17T21:19:53Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14944
dc.source.beginpage217
dc.source.conferenceULSI Process Characterization 6
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
dc.source.endpage227
dc.title

Stress characterization of selective epitaxial Si1-xGex deposition for embedded source/drain before and after millisecond laser anneal

dc.typeProceedings paper
dspace.entity.typePublication
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