Publication:
Wafer Edge Defectivity and Its Correlation to Process Parameters
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0000-0003-4308-0381 | |
| cris.virtual.orcid | 0009-0009-3247-3252 | |
| cris.virtualsource.department | 88d4cdb2-8ec4-4aa4-87ee-9719850d7416 | |
| cris.virtualsource.department | 57507ba7-1ade-47a6-93e7-ea2b7474cc88 | |
| cris.virtualsource.orcid | 88d4cdb2-8ec4-4aa4-87ee-9719850d7416 | |
| cris.virtualsource.orcid | 57507ba7-1ade-47a6-93e7-ea2b7474cc88 | |
| dc.contributor.author | Ren, Huan | |
| dc.contributor.author | Gronheid, Roel | |
| dc.contributor.author | Sah, Kaushik | |
| dc.contributor.author | Bouckou, Loemba | |
| dc.contributor.author | Cheng, Guojie | |
| dc.contributor.author | Gao, Xu | |
| dc.contributor.author | Tang, Weiwei | |
| dc.contributor.author | Chen, Zhijin | |
| dc.contributor.author | Zafar, Khurram | |
| dc.contributor.author | Higgins, Craig | |
| dc.contributor.author | Zhang, Cao | |
| dc.contributor.author | Groeger, Philip | |
| dc.contributor.author | Bald, Holger | |
| dc.contributor.author | Roy, Syamashree | |
| dc.contributor.author | Blanco, Victor | |
| dc.contributor.imecauthor | Roy, Syamashree | |
| dc.contributor.imecauthor | Blanco, Victor | |
| dc.contributor.orcidimec | Roy, Syamashree::0009-0009-3247-3252 | |
| dc.contributor.orcidimec | Blanco, Victor::0000-0003-4308-0381 | |
| dc.date.accessioned | 2025-07-31T04:00:38Z | |
| dc.date.available | 2025-07-31T04:00:38Z | |
| dc.date.issued | 2025 | |
| dc.identifier.doi | 10.1117/12.3051868 | |
| dc.identifier.eisbn | 978-1-5106-8635-9 | |
| dc.identifier.isbn | 978-1-5106-8634-2 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/45993 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.beginpage | 1 | |
| dc.source.conference | 2025 Conference on Optical and EUV Nanolithography | |
| dc.source.conferencedate | 2025-04-22 | |
| dc.source.conferencelocation | San Jose | |
| dc.source.journal | Proceedings of SPIE | |
| dc.source.numberofpages | 6 | |
| dc.title | Wafer Edge Defectivity and Its Correlation to Process Parameters | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |