Publication:

Wafer Edge Defectivity and Its Correlation to Process Parameters

Date

2025
Proceedings Paper
https://doi.org/10.1117/12.3051868
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dc.contributor.authorRen, Huan
dc.contributor.authorGronheid, Roel
dc.contributor.authorSah, Kaushik
dc.contributor.authorBouckou, Loemba
dc.contributor.authorCheng, Guojie
dc.contributor.authorGao, Xu
dc.contributor.authorTang, Weiwei
dc.contributor.authorChen, Zhijin
dc.contributor.authorZafar, Khurram
dc.contributor.authorHiggins, Craig
dc.contributor.authorZhang, Cao
dc.contributor.authorGroeger, Philip
dc.contributor.authorBald, Holger
dc.contributor.authorRoy, Syamashree
dc.contributor.authorBlanco, Victor
dc.contributor.imecauthorRoy, Syamashree
dc.contributor.imecauthorBlanco, Victor
dc.contributor.orcidimecRoy, Syamashree::0009-0009-3247-3252
dc.contributor.orcidimecBlanco, Victor::0000-0003-4308-0381
dc.date.accessioned2025-07-31T04:00:38Z
dc.date.available2025-07-31T04:00:38Z
dc.date.issued2025
dc.identifier.doi10.1117/12.3051868
dc.identifier.eisbn978-1-5106-8635-9
dc.identifier.isbn978-1-5106-8634-2
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45993
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.conference2025 Conference on Optical and EUV Nanolithography
dc.source.conferencedateFEB 24-27, 2025
dc.source.conferencelocationSan Jose
dc.source.numberofpages6
dc.source.volume13424
dc.title

Wafer Edge Defectivity and Its Correlation to Process Parameters

dc.typeProceedings paper
dspace.entity.typePublication
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