Vacuum ultra-violet damage and damage mitigation for plasma processing of highly porous organosilicate glass dielectrics

de Marneffe, Jean-Francois; Zhang, Liping; Heyne, Markus; Lukaszewicz, Mikolasj; Porter, Stephen Barry; Vajda, Felim; Rutigliani, Vito; Krishtab, Mikhail; Goodyear, Andy; Cooke, Mike; Verdonck, Patrick; Baklanov, Mikhaïl

doi:10.1063/1.4932202

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Vacuum ultra-violet damage and damage mitigation for plasma processing of highly porous organosilicate glass dielectrics

Date

2015

Journal article

https://doi.org/10.1063/1.4932202

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de Marneffe, Jean-Francois

;

Zhang, Liping

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Heyne, Markus

;

Lukaszewicz, Mikolasj

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Porter, Stephen Barry

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Journal

Journal of Applied Physics

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Acq. date: 2026-04-06

Vacuum ultra-violet damage and damage mitigation for plasma processing of highly porous organosilicate glass dielectrics

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