Publication:

Vacuum ultra-violet damage and damage mitigation for plasma processing of highly porous organosilicate glass dielectrics

Date

2015
Journal article
https://doi.org/10.1063/1.4932202
Simple item page Full metadata Statistics
 
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0001-5178-6670
cris.virtual.orcid0000-0001-6215-8506
cris.virtual.orcid#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0003-2454-0602
cris.virtual.orcid#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtualsource.departmentbce8c338-4d24-430a-a452-479a72e43639
cris.virtualsource.departmentc896eb73-5708-4d20-a4cd-a17e9ff45cf0
cris.virtualsource.departmentbcdff4f0-2d0d-477d-b384-4268536d7fe2
cris.virtualsource.department9c91d1fc-e61a-43a6-86bd-9f01969da8a0
cris.virtualsource.department5fc73164-72f0-4f1a-a4a8-c759f8c39c67
cris.virtualsource.orcidbce8c338-4d24-430a-a452-479a72e43639
cris.virtualsource.orcidc896eb73-5708-4d20-a4cd-a17e9ff45cf0
cris.virtualsource.orcidbcdff4f0-2d0d-477d-b384-4268536d7fe2
cris.virtualsource.orcid9c91d1fc-e61a-43a6-86bd-9f01969da8a0
cris.virtualsource.orcid5fc73164-72f0-4f1a-a4a8-c759f8c39c67
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorZhang, Liping
dc.contributor.authorHeyne, Markus
dc.contributor.authorLukaszewicz, Mikolasj
dc.contributor.authorPorter, Stephen Barry
dc.contributor.authorVajda, Felim
dc.contributor.authorRutigliani, Vito
dc.contributor.authorKrishtab, Mikhail
dc.contributor.authorGoodyear, Andy
dc.contributor.authorCooke, Mike
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorZhang, Liping
dc.contributor.imecauthorKrishtab, Mikhail
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.date.accessioned2021-10-22T18:50:40Z
dc.date.available2021-10-22T18:50:40Z
dc.date.embargo9999-12-31
dc.date.issued2015
dc.identifier.doi10.1063/1.4932202
dc.identifier.issn0021-8979
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25141
dc.identifier.urlhttp://scitation.aip.org/content/aip/journal/jap/118/13/10.1063/1.4932202
dc.source.beginpage133302
dc.source.issue13
dc.source.journalJournal of Applied Physics
dc.source.volume118
dc.title

Vacuum ultra-violet damage and damage mitigation for plasma processing of highly porous organosilicate glass dielectrics

dc.typeJournal article
dspace.entity.typePublication
Files

Original bundle

Name:
31809.pdf
Size:
1.13 MB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Articles