Publication:

A successful selective epitaxial Si1-xGex deposition process for HBT-BiCMOS and high-mobility heterojunction pMOS applications

Date

2004
Journal article
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dc.contributor.authorLoo, Roger
dc.contributor.authorCaymax, Matty
dc.contributor.authorPeytier, Ivan
dc.contributor.authorDecoutere, Stefaan
dc.contributor.authorCollaert, Nadine
dc.contributor.authorVerheyen, Peter
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorDe Meyer, Kristin
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.accessioned2021-10-15T14:32:35Z
dc.date.available2021-10-15T14:32:35Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9220
dc.source.beginpage64
dc.source.endpage80
dc.source.issue2
dc.source.journalYield Management Solutions
dc.source.volume6
dc.title

A successful selective epitaxial Si1-xGex deposition process for HBT-BiCMOS and high-mobility heterojunction pMOS applications

dc.typeJournal article
dspace.entity.typePublication
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