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Raised source/drains with disposable spacers for sub 100nm CMOS technologies

Date

2001
Proceedings Paper
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dc.contributor.authorDe Meyer, Kristin
dc.contributor.authorKubicek, Stefan
dc.contributor.authorvan Meer, Hans
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.imecauthorKubicek, Stefan
dc.date.accessioned2021-10-14T16:46:18Z
dc.date.available2021-10-14T16:46:18Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5198
dc.source.beginpage87
dc.source.conferenceExtended Abstracts of International Workshop on Junction Technology
dc.source.conferencedate29/11/2001
dc.source.conferencelocationTokyo Japan
dc.source.endpage90
dc.title

Raised source/drains with disposable spacers for sub 100nm CMOS technologies

dc.typeProceedings paper
dspace.entity.typePublication
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