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Advanced PnR Logic Patterning Enabled by High-NA EUV Lithography
Publication:
Advanced PnR Logic Patterning Enabled by High-NA EUV Lithography
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Date
2025
Proceedings Paper
https://doi.org/10.1117/12.3051054
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Roy, Syamashree
;
Thiam, Arame
;
Feurprier, Yannick
;
Franke, Joern-Holger
;
Sah, Kaushik
;
Chen, Zhijin
;
Cheng, Bobo
;
Gong, Chenwei
;
Baskaran, Balakumar
;
Bekaert, Joost
;
Nafus, Kathleen
;
Fukui, Nobuyuki
;
Tsuboi, Atsushi
;
Niroomand, Ardavan
;
Gillijns, Werner
;
Vats, Hemant
;
Sherazi, Yasser
;
Carballo, Victor M. Blanco
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Acq. date: 2026-01-07
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Views
38
since deposited on 2025-07-31
3
last month
1
last week
Acq. date: 2026-01-07
Citations