Publication:

Advanced PnR Logic Patterning Enabled by High-NA EUV Lithography

Date

2025

Proceedings Paper

https://doi.org/10.1117/12.3051054

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Author(s)

Roy, Syamashree

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Feurprier, Yannick

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Franke, Joern-Holger

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Baskaran, Balakumar

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Nafus, Kathleen

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Fukui, Nobuyuki

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Tsuboi, Atsushi

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Niroomand, Ardavan

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Gillijns, Werner

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;

Sherazi, Yasser

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Journal

Proceedings of SPIE

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42 since deposited on 2025-07-31

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Acq. date: 2026-03-17