Publication:

Advanced PnR Logic Patterning Enabled by High-NA EUV Lithography

Date

2025
Proceedings Paper
https://doi.org/10.1117/12.3051054
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dc.contributor.authorRoy, Syamashree
dc.contributor.authorThiam, Arame
dc.contributor.authorFeurprier, Yannick
dc.contributor.authorFranke, Joern-Holger
dc.contributor.authorSah, Kaushik
dc.contributor.authorChen, Zhijin
dc.contributor.authorCheng, Bobo
dc.contributor.authorGong, Chenwei
dc.contributor.authorBaskaran, Balakumar
dc.contributor.authorBekaert, Joost
dc.contributor.authorNafus, Kathleen
dc.contributor.authorFukui, Nobuyuki
dc.contributor.authorTsuboi, Atsushi
dc.contributor.authorNiroomand, Ardavan
dc.contributor.authorGillijns, Werner
dc.contributor.authorVats, Hemant
dc.contributor.authorSherazi, Yasser
dc.contributor.authorBlanco, Victor
dc.contributor.imecauthorRoy, Syamashree
dc.contributor.imecauthorFranke, Joern-Holger
dc.contributor.imecauthorBaskaran, Balakumar
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorNiroomand, Ardavan
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorVats, Hemant
dc.contributor.imecauthorSherazi, Yasser
dc.contributor.imecauthorCarballo, Victor M. Blanco
dc.contributor.orcidimecRoy, Syamashree::0009-0009-3247-3252
dc.contributor.orcidimecFranke, Joern-Holger::0000-0002-3571-1633
dc.contributor.orcidimecBaskaran, Balakumar::0000-0002-5651-7768
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecSherazi, Yasser::0000-0002-4076-8597
dc.date.accessioned2025-07-31T04:00:02Z
dc.date.available2025-07-31T04:00:02Z
dc.date.issued2025
dc.identifier.doi10.1117/12.3051054
dc.identifier.eisbn978-1-5106-8635-9
dc.identifier.isbn978-1-5106-8634-2
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45987
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage1342410-1
dc.source.conference2025 Conference on Optical and EUV Nanolithography
dc.source.conferencedate2025-04-22
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.numberofpages1342410-8
dc.title

Advanced PnR Logic Patterning Enabled by High-NA EUV Lithography

dc.typeProceedings paper
dspace.entity.typePublication
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