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A wet chemical method for the determination of thickness of SiO2 layers below the nanometer level
Publication:
A wet chemical method for the determination of thickness of SiO2 layers below the nanometer level
Date
1999
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
De Smedt, Frank
;
Stevens, G.
;
De Gendt, Stefan
;
Cornelissen, Ingrid
;
Arnauts, Sophia
;
Meuris, Marc
;
Heyns, Marc
;
Vinckier, Chris
Journal
J. Electrochem. Soc.
Abstract
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1964
since deposited on 2021-10-06
Acq. date: 2025-10-23
Citations
Metrics
Views
1964
since deposited on 2021-10-06
Acq. date: 2025-10-23
Citations