Publication:
A wet chemical method for the determination of thickness of SiO2 layers below the nanometer level
Date
| dc.contributor.author | De Smedt, Frank | |
| dc.contributor.author | Stevens, G. | |
| dc.contributor.author | De Gendt, Stefan | |
| dc.contributor.author | Cornelissen, Ingrid | |
| dc.contributor.author | Arnauts, Sophia | |
| dc.contributor.author | Meuris, Marc | |
| dc.contributor.author | Heyns, Marc | |
| dc.contributor.author | Vinckier, Chris | |
| dc.contributor.imecauthor | De Gendt, Stefan | |
| dc.contributor.imecauthor | Cornelissen, Ingrid | |
| dc.contributor.imecauthor | Arnauts, Sophia | |
| dc.contributor.imecauthor | Meuris, Marc | |
| dc.contributor.imecauthor | Heyns, Marc | |
| dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
| dc.contributor.orcidimec | Meuris, Marc::0000-0002-9580-6810 | |
| dc.date.accessioned | 2021-10-06T10:57:09Z | |
| dc.date.available | 2021-10-06T10:57:09Z | |
| dc.date.issued | 1999 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3370 | |
| dc.source.beginpage | 1873 | |
| dc.source.endpage | 1878 | |
| dc.source.issue | 5 | |
| dc.source.journal | J. Electrochem. Soc. | |
| dc.source.volume | 146 | |
| dc.title | A wet chemical method for the determination of thickness of SiO2 layers below the nanometer level | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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