Publication:

Evidence of printing blank-related defects on EUV masks missed by blank inspection

Date

2011
Proceedings Paper
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dc.contributor.authorJonckheere, Rik
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorHendrickx, Eric
dc.contributor.authorRonse, Kurt
dc.contributor.authorBret, Tristan
dc.contributor.authorHofmann, Thorsten
dc.contributor.authorMagana, John
dc.contributor.authorAharonson, Israel
dc.contributor.authorMeshulach, Doron
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-19T14:37:57Z
dc.date.available2021-10-19T14:37:57Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19138
dc.source.beginpage79850W
dc.source.conference27th European Mask and Lithography Conference - EMLC
dc.source.conferencedate18/01/2011
dc.source.conferencelocationDresden Germany
dc.title

Evidence of printing blank-related defects on EUV masks missed by blank inspection

dc.typeProceedings paper
dspace.entity.typePublication
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